Deposition Equipment
The G2N Centre has the deposition capabilities for a variety of semiconductor, dielectric and conductive thing films: amorphous, nanocrystalline and poly-Si, SiOx, SiNx, SiOxNy, SiC, SiCN, ITO, ZnO, Al, Cr, Mo, W, Ta, organic materials (both small molecule and polymers). The maximum substrate size varies from 3" to 12" depending on the system.
- Angstrom Evovac Vacuum Deposition System
- AJA Sputtering Tool
- CVE Sputtering System
- Edwards Sputtering System
- High temperature PECVD
- Intlvac Thermal/E-Beam Evaporator
- PlasmaTherm 790 Series PECVD
- Reel to Reel Cluster Tool
- Selenium Evaporator
- WLOS Cluster Sputtering System
- WLO1 and WLO2 Deposition Systems
